Practical Electron Microscopy and Database

Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix

XRD of Titanium Silicides

Table 982. XRD of Titanium Silicides. Titanium silicides XRD TiSi2 XRD patterns of the 0.26 µm TiSi2 lines after the first RTA at 650 °C and the second RTA at 825 °C [1]. Only the C49(131) peak is observed after the first RTA.  XRD patterns of the 0.26 µm TiSi2 lines after the first RTA at 650 °C and the second RTA at 825 °C [1]                         [1] Kaori Tai, Masao Okihara, Makiko Kageyama, Yusuke Harada, and Hiroshi Onoda, Effect of preamorphization implantation on C54–TiSi 2 formation in salicided narrow lines, Journal of Applied Physics, 85(6), 3132, 1999.